Growth and Applicability of Radiation-responsive Silica Nanowires

ii ABSTRACT Surface energetics play an important role in processes on the nanoscale. Nanowire growth via vapor-liquid-solid (VLS) mechanism is no exception in this regard. Interfacial and line energies are found to impose some fundamental limits during three-phase nanowire growth and lead to formation of stranded nanowires with fascinating characteristics such as high responsiveness towards ion irradiation. By using two materials with a relatively low surface energy (indium and silicon oxide) this is experimentally and theoretically demonstrated in this doctoral thesis. The augmentation of VLS nanowire growth with ion bombardment enables fabrication of vertically aligned silica nanowires over large areas. Synthesis of their arrays begins with a thin indium film deposited on a Si or SiO 2 surface. At temperatures below 200ºC, the indium film becomes a self-organized seed layer of molten droplets, receiving a flux of atomic silicon by DC magnetron sputtering. Simultaneous vigorous ion bombardment through substrate biasing aligns the growing nanowires vertically and expedites mixing of oxygen and silicon into the indium. The vertical growth rate can reach up to 1000 nm-min −1 in an environment containing only argon and traces of water vapor. Silicon oxide precipitates from each indium seed in the form of multiple thin strands having diameters less than 9 nm and practically independent of droplet size. The strands form a single loose bundle, eventually consolidating to form one vertically aligned nanowire. These observations are in stark contrast to conventional VLS growth in which one liquid droplet precipitates a single solid nanowire and in which the precipitated wire diameter is directly proportional to the droplet diameter. The origin of these differences is revealed through a detailed force balance analysis, analogous to Young's relation, at the three-phase line. The liquid-solid interfacial energy of indium/silica is found to be the largest energy contribution at the three-phase line with 670-850 mJ-m-². Our analysis further reveals the existence of an additional force at this line that behaves as a negative line tension (or line energy). Its contribution is relatively small, but important for stable and small nanowire growth. The value of the line tension lies in the range of-0.1 to-1.0 nJ-m-1. Spontaneous alignment of these stranded, free-standing wires toward a source of directional ion irradiation is proposed to be driven by local surface area minimization. An iii intuitive model for this is provided and experimentally verified through post-growth reorientation of nanowire patterns over a wide range of angles …